Printing – Antismut device – Anti-offset material application
Patent
1974-09-18
1976-10-26
Coughenour, Clyde I.
Printing
Antismut device
Anti-offset material application
96 1M, 96 14, 1014011, 101467, B41C 106
Patent
active
039877280
ABSTRACT:
A relief printing process utilizes a low relief printing form which is inked with a pressure transferable, non-liquid marking material prior to each printing impact. The printing form comprises a support layer on which there is deposited, in an imagewise pattern, a monolayer of uniformly sized granular developing particles within the range of about 25 to about 150 microns in diameter. The printing form can be prepared by a variety of colloid-transfer or electrostatic techniques.
REFERENCES:
patent: 627229 (1899-06-01), Foster
patent: 1021953 (1912-04-01), Steele
patent: 2311047 (1943-02-01), Hagelin
patent: 2953987 (1960-09-01), Johnson et al.
patent: 2955052 (1960-10-01), Carlson et al.
patent: 3010391 (1961-11-01), Buskes et al.
patent: 3220837 (1965-11-01), Land et al.
patent: 3223032 (1965-12-01), Boardman et al.
patent: 3223838 (1965-12-01), Hoshino et al.
patent: 3364858 (1968-01-01), Kojima et al.
patent: 3545997 (1970-12-01), Hochberg
patent: 3592644 (1971-07-01), Vrancken et al.
patent: 3645204 (1972-02-01), Gosnell
patent: 3788845 (1974-01-01), Osawa et al.
Miller Howard A.
Smith Kenneth L.
Stacy Peter M.
Coughenour Clyde I.
Eastman Kodak Company
Husser John D.
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