Regulation and stabilization of the AlF.sub.3 content in an alum

Chemistry: electrical and wave energy – Processes and products

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2041531, 204245, C25C 306, C25C 320

Patent

active

050947281

ABSTRACT:
A method is used for regulating and stabilizing an AlF.sub.3 content (c), which is at least about 10% by weight, in the bath of an electrolysis cell for the production of aluminum from alumina dissolved in a cryolite melt.
The individual state of an aluminum electrolysis cell, in particular of the cathodic carbon sump thereof, is analyzed for a period (t.sub.1) from a series of measured values, comprising a plurality of parameters. By means of a model calculation, the optimum time delay (ZV) between the addition of AlF.sub.3 and its effect in the electrolyte is determined. The additions (z) of AlF.sub.3 are calculated for a preset defined AlF.sub.3 content (c) allowing for the time delay (ZV), and AlF.sub.3 is added in portions or continuously.

REFERENCES:
patent: 3380897 (1968-04-01), Dewey
patent: 3471390 (1969-10-01), Kibby et al.
patent: 4654129 (1987-03-01), Leroy
patent: 4654130 (1987-03-01), Tabereaux et al.
patent: 4668350 (1987-05-01), Desclaux et al.
patent: 4766552 (1988-08-01), Aalbu et al.
patent: 4814050 (1989-03-01), McGraw et al.
Soviet Inventions Illustrated, Oct. 6, 1982, Zusammenfassung No. 71690 M28.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Regulation and stabilization of the AlF.sub.3 content in an alum does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Regulation and stabilization of the AlF.sub.3 content in an alum, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Regulation and stabilization of the AlF.sub.3 content in an alum will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2282677

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.