Registration of patterns formed of multiple fields

Details Registration of patterns formed of multiple fields Registration of patterns formed of multiple fields

1993-09-09

1994-04-05

Black, Thomas G.

Boots, shoes, and leggings

2504911, 2504922, 436518, 364491, 364489, G06F 1500, G01J 100, A61N 500

Patent

active

053011244

ABSTRACT:
A pattern is aligned and exposed with a lithography system so that chips larger than the deflection field can be formed by exposing M.times.N fields in a mosaic pattern. The method corrects the deflection field to compensate for the orientation of a previous pattern on a substrate and compensates for errors due to height caused by the beam landing non perpendicular to the target. Two basic procedures disclosed are called "3-mark" which are only applicable to 2.times.2 arrays of fields, and "M.times.N" which covers the general situation, but with slightly less accuracy.

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