Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component
Patent
1975-11-28
1978-02-14
Thomas, Earl C.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Carbon dioxide or hydrogen sulfide component
423223, 423228, 423232, 423236, 423242, 423243, B01D 5334
Patent
active
040738639
ABSTRACT:
Improvements in the elimination and recovery of gaseous acid impurities from a gaseous mixture containing them, by an absorbing step, wherein said gaseous mixture is brought into contact with an alkaline absorbing solution and a regeneration step wherein the exhausted absorbing solution is regenerated by steam stripping, said absorption step comprising a main column and a secondary column, the main column operating at a higher pressure and by means of a supply of outside heat, the secondary column operating at a lower pressure and substantially by means of the steam obtained by expansion of the solution regenerated in the main column. The exhausted solution to be regenerated is conveyed firstly in one of the two regeneration columns wherein it is regenerated in an incomplete way, and subsequently into the other column where its regeneration is completed.
REFERENCES:
patent: 3563695 (1971-02-01), Benson
patent: 3563696 (1971-02-01), Benson
patent: 3714327 (1973-01-01), Giammarco
patent: 3725529 (1973-03-01), Giammarco et al.
patent: 3823222 (1974-07-01), Benson
patent: 3962404 (1976-06-01), Giammarco
Giammarco Giuseppe
Giammarco Paolo
LandOfFree
Regeneration of absorbent solutions used for removing gaseous ac does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Regeneration of absorbent solutions used for removing gaseous ac, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Regeneration of absorbent solutions used for removing gaseous ac will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-524489