Regeneration method and apparatus of wafer and substrate

Semiconductor device manufacturing: process – Repair or restoration

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Details

438959, 438906, H01L 2100

Patent

active

059813016

ABSTRACT:
A method for regenerating a used wafer or substrate by removing a functional coating film formed on the used wafer or substrate, comprising the steps of:

REFERENCES:
patent: 5472371 (1995-12-01), Yamakura et al.
patent: 5622875 (1997-04-01), Lawrence

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