Refurbishing spent sputtering targets

Details Refurbishing spent sputtering targets Refurbishing spent sputtering targets

2007-02-13

2007-02-13

McDonald, Rodney G. (Department: 1753)

Powder metallurgy processes

Powder metallurgy processes with heating or sintering

Making composite or hollow article

C419S030000, C419S032000, C419S048000, C419S049000, C204S298120, C204S298130

Reexamination Certificate

active

10243948

ABSTRACT:
Spent sputtering targets are refurbished by filling the depleted region of the target with new sputter material using a hot isostatic pressing or HIP'ing technique.

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Korean Office Action dated Nov. 28, 2005.
Notice of Decision for Final Rejection, Korean Intellectual Property Office, Appl. No. 10-2004-7003873, Refurbishing Spent Sputtering Targets, Apr. 6, 2006 (Korean and English Translation).
Magnetron Sputter Target Material for Recording Medium, Xue Han, et al. Rare Metal, vol. 21 (5), Sep. 1997, pp. 366-370. (Chinese).
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