Refractory metal silicide sputtering target

Details Refractory metal silicide sputtering target Refractory metal silicide sputtering target

1986-12-18

1988-06-14

Lechert, Jr., Stephen J.

Specialized metallurgical processes, compositions for use therei

Compositions

Consolidated metal powder compositions

204292, 204293, 419 10, 419 33, 419 45, 419 48, 419 60, 501 96, B22F 100

Patent

active

047509325

ABSTRACT:
A refractory metal silicide sputtering target is made by reacting refractory metal and silicon to about 70 to 90% completion of the reaction, comminuting the material, and then vacuum hot pressing the comminuted material to a high density compact.

REFERENCES:
patent: 4135286 (1979-01-01), Wright et al.
patent: 4619695 (1986-10-01), Oikawa et al.
patent: 4619697 (1986-10-01), Hijikata et al.
patent: 4620872 (1986-11-01), Hijikata et al.
patent: 4663120 (1987-05-01), Parent et al.

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