Refractory effusion cell to generate a reproducible, uniform and

Details Refractory effusion cell to generate a reproducible, uniform and Refractory effusion cell to generate a reproducible, uniform and

1989-08-29

1991-07-23

Berman, Jack I.

Radiant energy

Electrically neutral molecular or atomic beam devices and...

392388, 392389, H01S 100, C23C 1426

Patent

active

050346040

ABSTRACT:
A device and method for producing an ultra pure molecular beam of elemental molecules utilizing a reduced thermal gradient filament construction in an effusion cell is provided. The effusion cell comprises a crucible having an open and a closed end and at least one heating filament distributed immediate the crucible. The at least one heating filament or filaments are provided having a first portion having a first pitch in proximal relationship to the open end of the crucible and having a second portion having a second pitch wherein the first pitch is of a higher spatial frequency than the second pitch. The heating filament is non-inductively wound about the crucible and positioned in conformity to the outside structure of the crucible. The heat shield is positioned proximate and about the crucible and heating filament or filaments. The heating filaments are connected to a controllable electric power supply producing a near constant temperature along the long axis of the crucible. By placing source material in the crucible and placing the crucible heating filaments and heat shield in a reduced pressure atmosphere and powering the heating filaments, a substantially constant temperature is produced along the crucible long axis resulting in an ultra pure molecular beam of elemental molecules of the source material.

REFERENCES:
patent: 2330135 (1948-04-01), Alexander
patent: 2793609 (1957-05-01), Tzu en Shen et al.
patent: 3153137 (1964-10-01), Drumheller
patent: 3662154 (1972-05-01), Harra
patent: 3974002 (1976-08-01), Casey, Jr. et al.
patent: 4137865 (1979-02-01), Cho
patent: 4181544 (1980-01-01), Cho
patent: 4239955 (1980-12-01), Cho
patent: 4385946 (1983-05-01), Finegan et al.
patent: 4392453 (1983-07-01), Luscher
patent: 4426569 (1984-01-01), Miller et al.
patent: 4518846 (1985-05-01), Freeouf et al.
patent: 4543467 (1985-09-01), Eisele et al.
patent: 4553022 (1985-11-01), Colombo
patent: 4570066 (1986-02-01), Schlag et al.
patent: 4607152 (1986-08-01), Allovon et al.
patent: 4646680 (1987-03-01), Maki
patent: 4648347 (1987-03-01), Aichert et al.
patent: 4699083 (1987-10-01), Huet et al.
patent: 4748315 (1988-05-01), Takahashi et al.
patent: 4777022 (1988-10-01), Boldish et al.
patent: 4789779 (1988-12-01), Drullinger
Calawa, "On the use of AsH.sub.3 in the Molecular Beam Epitaxial Growth of GaAs", Appl. Phys. Lett., vol. 38, No. 9, pp. 701-703, (May 1, 1981).
EPI Systems' "Dual Filament Effusion Cells".
EPI System Borchure for Model 175 Cracking Effusion Cell Garcia, et al., "Dimer Arsenic Source Using a High Efficiency Catalytic Cracking Oven for Molecular Beam Epitaxy", Appl. Phys. Lett., vol. 51, No. 8, pp. 593-595, (Aug. 24, 1987).

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