Optical: systems and elements – Miscellaneous
Reexamination Certificate
2006-02-14
2006-02-14
Geyer, Scott (Department: 2812)
Optical: systems and elements
Miscellaneous
Reexamination Certificate
active
06999254
ABSTRACT:
A system and/or method are disclosed for measuring and/or controlling refractive index (n) and/or lithographic constant (k) of an immersion medium utilized in connection with immersion lithography. A known grating structure is built upon a substrate. A refractive index monitoring component facilitates measuring and/or controlling the immersion medium by utilizing detected light scattered from the known grating structure.
REFERENCES:
patent: 5610683 (1997-03-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5879866 (1999-03-01), Starikov et al.
patent: 5900354 (1999-05-01), Batchelder
patent: 6309809 (2001-10-01), Starikov et al.
patent: 6448568 (2002-09-01), Allen et al.
patent: 6781670 (2004-08-01), Krautschik
patent: 6788477 (2004-09-01), Lin
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0123040 (2003-07-01), Almogy
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2005/0018208 (2005-01-01), Levinson
patent: 2005/0046813 (2005-03-01), Streefkerk et al.
patent: 2 141 223 (1984-12-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 2005/013008 (2005-02-01), None
International Search Report, PCT/US2004/026716, mailed May 20, 2005.
Phan Khoi A.
Rangarajan Bharath
Singh Bhanwar
Subramanian Ramkumar
Advanced Micro Devices , Inc.
Amin & Turocy LLP
Geyer Scott
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