Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Reexamination Certificate
2006-05-23
2011-12-06
Handal, Kaity V. (Department: 1723)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
C422S187000, C422S186220, C422S198000, C422S198000, C422S211000, C048S061000, C423S650000, C423S648100, C423S651000, C429S010000, C429S006000, C060S780000
Reexamination Certificate
active
08071045
ABSTRACT:
A reformer includes first and second reforming units which are stacked together. A first hole is formed at the center of a first receiver member of the first reforming unit, and a plurality of holes are formed in a peripheral portion of a second receiver member of the second reforming unit. In the structure, a reforming channel having a serpentine pattern going through the first and second holes is formed. In each of the first and second receiver members, a single layer of catalyst pellets is provided. Both end surfaces of the catalyst pellets substantially contact the first and second receiver members.
REFERENCES:
patent: 6120926 (2000-09-01), Szydlowski et al.
patent: 6896709 (2005-05-01), Han et al.
patent: 2002/0042035 (2002-04-01), Komiya et al.
patent: 2005/0048333 (2005-03-01), Pettit
patent: 0 989 621 (2000-03-01), None
patent: 1 300 190 (2003-04-01), None
patent: 05-129026 (1993-05-01), None
patent: 2001-019403 (2001-01-01), None
patent: 2001-106507 (2001-04-01), None
patent: 2001-146401 (2001-05-01), None
patent: 2002-531363 (2002-09-01), None
patent: WO-2004/045761 (2004-06-01), None
Handal Kaity V.
Honda Motor Co. Ltd.
Laurentano Anthony A.
Nelson Mullins Riley & Scarborough LLP
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