Illumination – Plural light sources – With modifier
Reexamination Certificate
2006-06-27
2006-06-27
Sember, Thomas M. (Department: 2875)
Illumination
Plural light sources
With modifier
C362S341000, C362S609000, C349S113000
Reexamination Certificate
active
07066624
ABSTRACT:
A structure of an ultra-micro reflector having abrasive surface with tapered micro bumps and free of resin layer and its fabrication method are provided. The reflector structure comprises mainly a layer of reflector metal, a scattering element with abrasive surface, and a layer of ITO. The abrasive surface has many tapered micro bumps. The reflector structure can be applied to a reflective or partially reflective LCD to achieve optimal performance. It makes the scattering angle of the reflective light source wider and more uniform. The variation of the gap of liquid crystal cells is greatly reduced, so that the reflective efficiency can be kept in an optimal condition. The reflector structure has larger scattering angle, smooth effect, and very good anti-glare effect. The fabrication process of the reflector structure is simple. The material cost for the abrasive surface is inexpensive. The reflector can endure higher temperature than conventional organic reflective elements, because the inorganic thin film process is used.
REFERENCES:
patent: 6219119 (2001-04-01), Nakai
patent: 6803980 (2004-10-01), Funahata et al.
Hsu Hung-Huei
Lin Wen-Jian
Liu Hong-Da
Lee Guiyoung
Prime View International Corporation Limited
Sember Thomas M.
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