Data processing: structural design – modeling – simulation – and em – Modeling by mathematical expression
Reexamination Certificate
2003-11-21
2009-12-15
Rodriguez, Paul L (Department: 2123)
Data processing: structural design, modeling, simulation, and em
Modeling by mathematical expression
C438S074000, C438S761000, C700S121000
Reexamination Certificate
active
07634389
ABSTRACT:
A method for obtaining an optimal reflectivity value for complex multilayer stacks is disclosed. Aspects of the present invention include generating a model of a multilayer stack and parameterizing each layer by a thickness and an index of refraction; allowing a user to input values for the parameters; calculating an extrema for a cost function of reflectivity R using the input parameter values; calculating sensitivity values S for the extrema points; and obtaining an optimal value by calculating a cost function R+S.
REFERENCES:
“IMD- Software for modeling the optical properties of multilayer films”, David L. Windt, Bell Laboratories, Murray Hill, New Jersey. Mar. 31, 1998.
“Optical Analysis of Complex Multilayer Structures Using Multiple Data Types”, Blaine Johs, et al. Optical Interference Coating, SPIE vol. 2253, 1994.
“Optical Lithography Simulation and Photoresist Optimization for Photomask Fabrication”, Benjamin M. Rathsack et al. Department of Chemical Engineering, The University of Texas at Austin. May 1999.
“Pattern recognition by an optical thin-film multilayer model”, Xiaodong Li and Martin Purvis. Annals of Mathematics and Artificial Intelligence, 1999.
Eib Nicholas
Ivanovic Lav
Xu Xudong
Cochran William W.
Cochran Freund & Young LLC
Janakiraman Nithya
LSI Corporation
Rodriguez Paul L
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