X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1986-04-25
1988-11-15
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 45, 378 49, 427160, 428698, 428704, 428627, G21K 106
Patent
active
047854707
ABSTRACT:
X-ray dispersive and reflective structures and materials are constructed which exhibit improved characteristics in specific ranges of interest. The structures are formed of metallic and non-metallic layer pairs. The structures are formed of alternating layers of Cr:C, Ni:C or V:C for carbon analysis and Mo:B.sub.4 C for beryllium an boron analysis. The layered structures can be formed from Ni:C for analysis of both carbon and boron.
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Hart Keith L.
Wood James L.
Church Craig E.
Freeman John C.
Goldman Richard M.
Ovonic Synthetic Materials Company Inc.
Siskind Marvin S.
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