Reflective-type mask blank for exposure, method of producing...

Details Reflective-type mask blank for exposure, method of producing... Reflective-type mask blank for exposure, method of producing...

2005-11-01

2005-11-01

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06960412

ABSTRACT:
In a reflective-type mask blank (10) for exposure which blank includes a substrate (1) having a principal surface, a reflective multilayer film (2) formed on the principal surface, and an absorber film (4) formed on the reflective multilayer film, an intermediate layer (3) is interposed between the reflective multilayer film and the absorber film and is resistant against an etching environment of the absorber film. The intermediate layer is made of a material comprising Ta as a main metal component. The reflective multilayer film is for reflecting exposure light which travels from the outside of the reflective-type mask blank towards the principal surface. The absorber film is for absorbing the exposure light.

REFERENCES:
patent: 6737201 (2004-05-01), Shoki et al.
patent: 8-213303 (1996-08-01), None

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