Reflective-type mask

Details Reflective-type mask Reflective-type mask

2011-06-14

2011-06-14

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07960076

ABSTRACT:
A reflective-type mask having a main surface including a pattern region in the main surface, the pattern region including a multilayer reflective film which reflects the exposure light and a first absorber pattern on the multilayer reflective film, the first absorber pattern including a pattern which absorbs the exposure light and corresponds to a pattern to be formed on a wafer, a light shielding region in the main surface for preventing a region on the wafer excluding a predetermined region from being irradiated with the exposure light when the main surface is irradiated with the exposure light for transferring the first absorber pattern to the predetermined region, the light shielding region including a second absorber pattern having a lower reflectivity to the exposure light than the first absorber pattern and being provided in a position differing from a position in which the first absorber pattern is provided.

REFERENCES:
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patent: 2004/0131948 (2004-07-01), Yan
patent: 2004/0188383 (2004-09-01), Lucas et al.
patent: 2006/0222961 (2006-10-01), Yan
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patent: 2004-266300 (2004-09-01), None
Takashi Kamo, Hajime Aoyama, Toshihiko Tanaka, Osamu Suga, Tsukasa Abe, Tadahiko Takikawa, Naoya Hayashi, Tsutomu Shoki, Youichi Usui, and Morio Hosoya,“EUVL practical mask structure with light shield area for 32nm half pitch and beyond” Proc. SPIE 7122, 712227 (2008), Online Publication Oct. 17, 2008.
Takashi Kamo, Hajime Aoyama, Toshihiko Tanaka, and Osamu Suga, “Impact of mask absorber properties on printability in EUV lithography,” Proc. SPIE 6730, 673017 (2007), Online Publication Oct. 30, 2007.
Kamo, et al., “Effects of mask absorber thickness on printability in EUV lithography with high resolution resist”, Proc. of SPIE, vol. 7028, pp. R1-R-12, (2008).

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