Reflective optical imaging system

Optical: systems and elements – Having significant infrared or ultraviolet property – Lens – lens system or component

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359208, 359729, G02B 2608

Patent

active

060142529

ABSTRACT:
An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.

REFERENCES:
patent: 5063586 (1991-11-01), Jewell et al.
patent: 5153898 (1992-10-01), Suzuki et al.
patent: 5212588 (1993-05-01), Viswanathan et al.
patent: 5220590 (1993-06-01), Bruning et al.
patent: 5315629 (1994-05-01), Jewell et al.
patent: 5353322 (1994-10-01), Bruning et al.
patent: 5410434 (1995-04-01), Shafer
"Design of reflective relay for soft x-ray lithography" by Rodgers et al.; SPIE vol. 1354, International Lens Design Conference (1990).
"Reflective systems design study for soft x-ray projection lithography" by Jewell et al.; J. Vac. Sci. Technol. B 8 (6) Nov./Dec. 1990.
"Optical system design issues in development of projection camera for EUV lithography" by Jewell ; SPIE vol. 2437 May 1995.

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