Radiant energy – Radiant energy generation and sources – With radiation modifying member
Reexamination Certificate
2011-08-23
2011-08-23
Johnston, Phillip A (Department: 2881)
Radiant energy
Radiant energy generation and sources
With radiation modifying member
C355S053000, C355S067000
Reexamination Certificate
active
08003960
ABSTRACT:
In order to obtain optimal reflectivity on optical elements for the EUV and the soft X-ray range, multilayers constructed of a number of layers are used. Contamination or degradation of the surface leads to imaging defects and transmission losses. In the prior art, it has been attempted to counter a negative change in the surface by providing a cover layer system on the surface of the reflective optical element that should protect the surface. The invention renders the influence of the surface degradation manageable by a targeted selection of the distribution of thickness of the cover layer system, whereby at least one layer of the cover layer system has a gradient that is not equal to zero.
REFERENCES:
patent: 4958363 (1990-09-01), Nelson et al.
patent: 5911858 (1999-06-01), Ruffner
patent: 5958605 (1999-09-01), Montcalm et al.
patent: 6157486 (2000-12-01), Benson et al.
patent: 6228512 (2001-05-01), Bajt et al.
patent: 6724462 (2004-04-01), Singh et al.
patent: 6937334 (2005-08-01), Monshouwer et al.
patent: 2005/0087699 (2005-04-01), Miyake
patent: 2008/0204861 (2008-08-01), Shiraishi
patent: 0708367 (1996-04-01), None
patent: 0824721 (1998-02-01), None
patent: 0922996 (1999-06-01), None
patent: 1186957 (2002-03-01), None
patent: 1260861 (2002-11-01), None
patent: 8-213312 (1996-08-01), None
patent: 03/032329 (2003-04-01), None
patent: 03/32329 (2003-04-01), None
patent: 2004/079753 (2004-09-01), None
U.S. Appl. No. 11/216,560, filed Oct. 25, 2005, Wedowski, Marco.
Singh, et al., Capping layers for extreme-ultraviolet multilayer interference coatings, Optics Letters, Optical Society of America, Washington, XP-002219427, vol. 26, No. 5, pp. 259-261, Mar. 1, 2001.
Malinowski, et al., Controlling Contamination in Mo/Si Multilayer Mirrors by Si Surface-capping Modifications, Proceedings of SPIE vol. 4688, (2002) XP008042287, pp. 442-453.
Oesterreich, et al., Multilayer reflectance during exposure to EUV radiation, Soft x-ray and EUV Imaging Systems, SPIE vol. 4146, XP-002289630, pp. 64-71, 2000.
Carl Zeiss SMT GmbH
Johnston Phillip A
Sughrue & Mion, PLLC
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