Reflective maskblanks

Details Reflective maskblanks Reflective maskblanks

2003-07-04

2008-03-25

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07348105

ABSTRACT:
A reflective mask and a reflective mask blank that can form a fine mask pattern with high accuracy in shape, achieve a sufficient contrast in a pattern inspection, and enable a pattern transfer with high accuracy. On a substrate (11), a multilayer reflective film (12) for reflecting an exposure light, a buffer layer (13), and an absorber layer for absorbing the exposure light are successively deposited in this order. This absorber layer has a layered structure composed of an uppermost layer (15) and a lower layer (14) other than it. The uppermost layer (15) exhibits a reflectance of 20% or less with respect to a light having an inspection wavelength for use in an inspection of a pattern formed in the absorber layer and further is formed of an inorganic material having a resistance against an etching condition in forming a pattern in the lower layer.

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Ted Liang, et al. “Enhanced Optical Inspectability of Patterned Euvl Mask”, Intel Corporation Components Research, Proceedings of SPIE Vo. 4562 (2002), pp. 288-296.
Semiconductor Equipment and Materials International SEMI Draft Document 3414 “Specification for Absorbing Film Stacks and Multilayers On Extreme Ultraviolet Lithography Mask Blanks” Document No. 3414 dated Apr. 29, 2002.

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