Reflective mask blank for exposure, reflective mask for...

Details Reflective mask blank for exposure, reflective mask for... Reflective mask blank for exposure, reflective mask for...

2011-03-22

2011-03-22

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07910264

ABSTRACT:
To provide a reflective mask blank for exposure that can solve a problem of adsorption failure in fixing a reflective mask using an electrostatic chuck and thus can flatten the surface of the mask using the electrostatic chuck, thereby realizing high-accuracy pattern transfer. In a reflective mask blank for exposure having a multilayer reflective film formed on a board and adapted to reflect exposure light and an absorbent layer formed on the multilayer reflective film and adapted to absorb the exposure light, the shape of a surface of the mask blank on its side opposite to its transfer pattern forming surface is a shape having a convex surface.

REFERENCES:
patent: 6756285 (2004-06-01), Moriceau et al.
patent: 6951502 (2005-10-01), Koike et al.
patent: 727198 (1995-03-01), None
patent: 8213303 (1996-08-01), None

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