Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-12-05
2010-06-15
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C428S430000
Reexamination Certificate
active
07736821
ABSTRACT:
To provide a substrate with a conductive film for an EUV mask blank having an increased surface hardness, and a substrate with a reflective multilayer film and an EUV mask blank using such a substrate with a conductive film.A substrate with a conductive film to be used for production of a reflective mask blank for EUV lithography, characterized in that the chief material of the conductive film is at least one member selected from the group consisting of Cr, Ti, Zr, Nb, Ni and V, and the conductive film contains B (boron) at an average concentration of from 1 to 70 at %.
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Hayashi Kazuyuki
Mikami Masaki
Sugiyama Takashi
Asahi Glass Company Limited
Fraser Stewart A
Huff Mark F
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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