Reflective mask blank for EUV lithography, and substrate...

Details Reflective mask blank for EUV lithography, and substrate... Reflective mask blank for EUV lithography, and substrate...

2011-08-23

2011-08-23

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08003282

ABSTRACT:
Provided are a substrate with a conductive film for an EUV mask blank in which the generation of particles due to abrasion between an electrostatic chuck and the substrate is prevented; and a substrate with a multilayer reflective film and an EUV mask blank each employing such a substrate with a conductive film.A substrate with a conductive film to be used for producing a reflective mask blank for EUV lithography, the conductive film containing chromium (Cr) and nitrogen (N), the average concentration of N in the conductive film being at least 0.1 atomic % and less than 40 atomic %, the crystal state of at least a surface of the conductive film being amorphous, the sheet resistance of the conductive film being at most 27 Ω/□, and the surface roughness (rms) of the conductive film being at most 0.5 nm.

REFERENCES:
patent: 7736821 (2010-06-01), Hayashi et al.
patent: 2007/0160874 (2007-07-01), Hayashi et al.
patent: 2008/0318140 (2008-12-01), Hayashi et al.
patent: 2002222764 (2002-08-01), None
patent: 2003-501823 (2003-01-01), None
patent: 2004320035 (2004-11-01), None
patent: 2005093723 (2005-04-01), None
patent: 2005-210093 (2005-08-01), None
patent: 2006049910 (2006-02-01), None
patent: 2006093454 (2006-04-01), None
patent: 2006324268 (2006-11-01), None
patent: WO 2007/069417 (2007-06-01), None

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