Reflective mask and manufacturing method for reflective mask

Details Reflective mask and manufacturing method for reflective mask Reflective mask and manufacturing method for reflective mask

2009-06-24

2011-12-06

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08071263

ABSTRACT:
A reflective mask comprising: a reflective layer that is arranged on a surface on a side on which EUV light is irradiated and reflects the EUV light; a buffer layer containing Cr that is arranged on a side of the reflective layer on which the EUV light is irradiated and covers an entire surface of the reflective layer; and a non-reflective layer that is arranged on a side of the buffer layer on which the EUV light is irradiated and in which an absorber that absorbs the irradiated EUV light is arranged in a position corresponding to a mask pattern to be reduced and transferred onto a wafer.

REFERENCES:
patent: 6699625 (2004-03-01), Lee et al.
patent: 2003/0162104 (2003-08-01), Shoki
patent: 2003/0228529 (2003-12-01), Dieu et al.
patent: 2007/0077499 (2007-04-01), Ikuta et al.
patent: 2006-13494 (2006-01-01), None

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