Reflective lithography mask inspection tool based on...

Optical: systems and elements – Diffraction – From zone plate

Reexamination Certificate

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C359S569000, C359S576000, C359S350000, C359S355000, C359S361000

Reexamination Certificate

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06914723

ABSTRACT:
A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.

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patent: 2002/0005938 (2002-01-01), Omura
patent: 1 006 400 (2000-06-01), None
patent: 1 006 400 (2003-05-01), None

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