Reflective lithographic mask

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430322, 430326, G03F 100

Patent

active

058276220

ABSTRACT:
The invention relates to a reflective phase-shifting lithographic mask having a reflective surface comprising a plurality of areas having different refractive indices.

REFERENCES:
patent: 4964701 (1990-10-01), Dorschner et al.
patent: 5052033 (1991-09-01), Ikeda et al.
patent: 5190836 (1993-03-01), Nakagawa et al.
patent: 5208125 (1993-05-01), Lowrey et al.
patent: 5229255 (1993-07-01), White
patent: 5328784 (1994-07-01), Fukuda
patent: 5338647 (1994-08-01), Nakagawa et al.
patent: 5393623 (1995-02-01), Kamon et al.
patent: 5514499 (1996-05-01), Iwamatsu et al.
von Bunau, R. et al., "Depth of Focus Enhancement in Optical Lithography", J. Vac. Sci. Technol. B 10(6), Nov./Dec. 1992, pp. 3047-3053.
Owen, G. et al., "1/8 um Optical Lithography", J. Vac. Sci. Technol. B 10(6), Nov./Dec. 1992, pp. 3032-3036.
Lee, Y. H. et al., Silicon on Quartz Reflective Masks for 0.25-um Micro-lithography, J. Vac. Sci. Technol. B 9(6), Nov./Dec. 1991, pp. 3138-3142.
Levenson, M. D., "The Coming Revolution in Photolithography", RJ 9106 (80919) Nov. 18, 1992, Physics.
Hsieh, R. L. et al., "All-Reflective Phase-Shifting Masks for Markie-Dyson Optics", J. Vac. Sci. Technol. B 10(6), Nov./Dec. 1992, pp. 3042-3046.
"Lithography's Leading Edge, Part I: Phase-Shift Technology", Semiconductor International, Feb. 1992, pp. 42-47.
Levenson, M. D., "What IS a Phase-Shifting Mask?", IBM Research Division, K32/802D 650 Harry Rd., San Jose, California 95120.
Levenson, M. D. et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Device, vol. ED-29, No. 12, Dec. 1982, pp. 1828-1836.
Mirsalehi, M. M., "Optical Information Processing", Encyclopedia of Physical Science and Technology, vol. 9, .COPYRGT.1987 pp. 658-666 & 511-513.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reflective lithographic mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reflective lithographic mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reflective lithographic mask will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1612540

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.