Reflection type reduction projection optical system

Details Reflection type reduction projection optical system Reflection type reduction projection optical system

1988-03-21

1989-03-14

Corbin, John K.

350442, 350505, G02B 1708

Patent

active

048120286

ABSTRACT:
A reflection type projection optical system suitable for projection of a micropattern object is capable of performing reduction projection. The projection optical system comprises first and second optical subsystems which are combined to set a Petzval sum to zero. A first optical subsystem S1 forms a reduced image of an object, and a second optical subsystem S2 forms a further reduced object image from the image formed by the first optical subsystem S1.

REFERENCES:
patent: 3748015 (1973-07-01), Offner
patent: 4293186 (1981-10-01), Offner
patent: 4331390 (1982-05-01), Shafer
patent: 4469414 (1984-09-01), Shafer
J. Dyson, "Unit Magnification Optical System Without Seidel Aberrations", Jul. 1959, pp. 713-716, Journal of Optical Society of America, vol. 49, No. 7.
C. G. Wynne, "A Unit-Power Telescope for Projection Copying", 1970, pp. 429-434, Optical Instruments and Techniques, Oriel Press Limited.
A. P. Grammatin, "Some Properties of Concentric Optical Systems", Apr. 1971, pp. 210-211, Optical Technology, vol. 38, No. 4.

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