Reflection type photomask with phase shifter

Details Reflection type photomask with phase shifter Reflection type photomask with phase shifter

1991-03-12

1993-03-02

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430269, 430321, G03F 900

Patent

active

051908360

ABSTRACT:
A reflection type photomask includes a substrate, and a reflecting surface formed on the substrate and including a first region and a second region which have a relative height difference. Due to the concavo-convex structure of the reflecting surface, a light reflected from the first region and a light reflected from the second region have a predetermined phase difference which may be used effectively to form a pattern on a photoresist layer.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto

Affiliated with

Also associated with

Rating

Reflection type photomask with phase shifter does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reflection type photomask with phase shifter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reflection type photomask with phase shifter will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-125805