Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-04-26
2011-04-26
Rosasco, Stephen (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07932002
ABSTRACT:
To provide a reflection-type mask having a reduced shadowing effect, capable of phase shift exposure and having a shading frame of sufficient shading performance. The mask includes a substrate11, a multilayer reflective film12which is formed above the substrate11, and which reflects exposure light, a first photoabsorber layer15which is formed above the multilayer reflective film12, and which absorbs the exposure light, a circuit pattern region16constituted, in conformity with a predetermined circuit pattern, of an opening formed as a result of removal of the first photoabsorber layer15and an absorbing portion where the first photoabsorber layer remains, and a shading region18having a reflectance with respect to the exposure light lower than that in the absorbing portion of the circuit pattern region16.
REFERENCES:
patent: 5549994 (1996-08-01), Watanabe et al.
patent: 2006/0222961 (2006-10-01), Yan
patent: 2-14511 (1990-01-01), None
patent: 2004-207593 (2004-07-01), None
patent: 2006-228766 (2006-08-01), None
patent: 2007-206563 (2007-08-01), None
Notification of Reasons for Rejection issued by the Japanese Patent Office on May 28, 2010, for Japanese Patent Application No. 2008-052198, and English-language translation thereof.
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Rosasco Stephen
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