Reflection type liquid crystal display provided with...

Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only

Reexamination Certificate

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C349S106000, C349S141000

Reexamination Certificate

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07046321

ABSTRACT:
In order to realize the manufacture of a reflection type liquid crystal display in the same manufacture processes as those of a transmission type liquid crystal display, a photolithography mask capable of forming both a gate electrode22and a reflective layer23,and a photolithography mask capable of forming only the gate electrode22are prepared, and by using either one of the masks, the reflection type liquid crystal display in which both the gate electrode22and the reflective layer23are formed on a transparent insulation substrate21,and the transmission type liquid crystal display in which only the gate electrode22is formed are selectively manufactured.

REFERENCES:
patent: 4106859 (1978-08-01), Doriguzzi et al.
patent: 5940154 (1999-08-01), Ukita et al.
patent: 6097459 (2000-08-01), Shimada et al.
patent: 6118508 (2000-09-01), Park
patent: 6122027 (2000-09-01), Ogawa et al.

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