Reflection Photomask

Details Reflection Photomask Reflection Photomask

1994-11-17

1996-07-23

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430322, 430396, G03F 900

Patent

active

055388183

ABSTRACT:
A reflection photomask includes a substrate having a surface; and a first reflection circuit pattern and a second reflection circuit pattern on the surface of the substrate so that light reflected from the first reflection circuit pattern is different in phase from light reflected from the second reflection circuit pattern.

REFERENCES:
patent: 5279911 (1994-01-01), Kamon et al.
patent: 5328784 (1994-07-01), Fukuda
patent: 5338647 (1994-08-01), Nakagawa et al.

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