Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-01-22
1997-03-11
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430311, 430315, 430322, 378 34, G03F 900
Patent
active
056099770
ABSTRACT:
A reflection phase shifting mask used to expose a pattern by forming reflected light having a phase difference upon reflection of light, includes a substrate for reflecting exposure light, a phase shifting layer formed on a portion on the substrate, and a light transmitting medium formed on the substrate and the phase shifting layer, wherein the thickness of the phase shifting layer is set such that the phase difference between light reflected by the substrate and light reflected by the phase shifting layer becomes 180.degree..
REFERENCES:
patent: 5040882 (1991-08-01), Markle
patent: 5318868 (1994-06-01), Hasegawa et al.
patent: 5328784 (1994-07-01), Fukuda
patent: 5338647 (1994-08-01), Nakagawa et al.
patent: 5399448 (1995-03-01), Nagata et al.
Hashimoto Koji
Inoue Soichi
Ito Shin'ichi
Iwamatsu Takayuki
Kawano Kenji
Kabushiki Kaisha Toshiba
Rosasco S.
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