Reflection mask, method of producing mask and method of forming

Details Reflection mask, method of producing mask and method of forming Reflection mask, method of producing mask and method of forming

1991-09-05

1994-07-12

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 378 34, 378 35, G03F 900

Patent

active

053287843

ABSTRACT:
By using a reflection mask for reflective reduction projection exposure which uses vacuum ultraviolet rays or soft X-rays of wavelength .lambda., there is enhancement of the resolution of the projection exposure by making the height of adjacent or neighboring reflective surfaces to be deviated by about (2n-1) x.lambda./(4 cos .THETA.) (where n=1, 2, 3, - - - ) with respect to the angle .THETA. subtended by the normal to the above reflective surfaces and the direction of incidence of the ultraviolet rays or the soft X-rays, thus inverting the phases of the vacuum ultraviolet rays or the soft X-rays reflected by the neighboring reflection regions. Therefore, the applicable range of the reduction projection exposure can be extended to 0.1 um or smaller.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5190836 (1993-03-01), Nakagawa et al.
Journal Vacuum Science Technology, B8 (6), Nov./Dec. 1990, "Soft X-Ray Projection Lithography", pp. 1325-1328.

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