Reflection mask for X ray

Details Reflection mask for X ray Reflection mask for X ray

Filed on

1992-09-30

Date issued

1995-03-21

Examiner

Chapman, Mark A.

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Radiation modifying product or process of making

SubSubClass

Radiation mask

Other Related Categories

430321, G03F 900

Type

Patent

Status

active

Patent number

053994485

Description

ABSTRACT:
In reflection mask for X ray having a predetermined pattern formed by reflecting portions comprising multilayer film and a non-reflecting portion, the reflecting portions are designed for generating a phase difference between reflected lights from opposite sides of the non-reflecting portion.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5130213 (1992-07-01), Berger et al.
patent: 5190836 (1993-03-01), Nakagawa et al.
Kinoshita, H. et al, "Soft X-Ray Reduction Lithography Using Multilayer Mirrors," J. Vac. Sci. Technol., B7(6), Nov./Dec. 1989, pp. 1648-1651.

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