Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1992-09-30
1995-03-21
Chapman, Mark A.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430321, G03F 900
Patent
active
053994485
ABSTRACT:
In reflection mask for X ray having a predetermined pattern formed by reflecting portions comprising multilayer film and a non-reflecting portion, the reflecting portions are designed for generating a phase difference between reflected lights from opposite sides of the non-reflecting portion.
REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5130213 (1992-07-01), Berger et al.
patent: 5190836 (1993-03-01), Nakagawa et al.
Kinoshita, H. et al, "Soft X-Ray Reduction Lithography Using Multilayer Mirrors," J. Vac. Sci. Technol., B7(6), Nov./Dec. 1989, pp. 1648-1651.
Murakami Katsuhiko
Nagata Hiroshi
Nakamura Hiroshi
Chapman Mark A.
Nikon Corporation
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