Reflection mask and electrically charged beam exposing apparatus

Details Reflection mask and electrically charged beam exposing apparatus Reflection mask and electrically charged beam exposing apparatus

1991-09-17

1993-10-19

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 2504922, 250396R, 250398, G03F 900

Patent

active

052544176

ABSTRACT:
A reflection mask has a reflection pattern which is formed on a required portion of the surface of a substrate and on which a voltage sufficient to reflect incident electrically charged beams is applied, and a non-reflection pattern which is formed on the other portion of surface of the substrate and on which a voltage sufficient to emit the electrically charged beams to the non-reflection pattern is applied.

REFERENCES:
patent: 5036209 (1991-07-01), Kataoka et al.
patent: 5130213 (1992-07-01), Berger et al.
Patent Abstracts of Japan, vol. 2, No. 90 (E-78) (4182), Jul. 22, 1978, & JP-A-53 054 974, May 18, 1978, H. Shibata, "Electron Beam Exposure System".

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