Reflection limiting photoresist composition with two azo dyes

Details Reflection limiting photoresist composition with two azo dyes Reflection limiting photoresist composition with two azo dyes

1986-11-13

1989-05-09

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430270, 430311, 430326, G03C 160

Patent

active

048289604

ABSTRACT:
A reflection limiting photoresist is disclosed.

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Carlson, Robert et al., "Control of One Micron Lines in Integrated Circuits," Honeywell SSED, Plymouth, Minnesota.

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