Reflection element of exposure light and production method...

Details Reflection element of exposure light and production method... Reflection element of exposure light and production method...

2007-01-30

2007-01-30

Assaf, Fayez G. (Department: 2872)

Optical: systems and elements

Light interference

Produced by coating or lamina

C359S587000, C359S590000

Reexamination Certificate

active

10510725

ABSTRACT:
A reflector for extreme ultraviolet light, its manufacture method, a phase shift mask, an exposure apparatus and a semiconductor manufacture method, capable of making the wavelength dependency of a reflectance via a plurality of reflection surfaces be coincident with an center wavelength of exposure light and retaining a sufficient energy reaching a subject to be exposed. The reflector for exposure light to be used for exposure of a subject to be exposed in a lithography process of manufacturing a semiconductor device is configured to have a multi-layer film structure made by repetitively stacking a plurality of layers in the same order. The periodical length of the repetitive stack unit of the multi-layer film structure is set in such a manner that the center of full width at half maximum of the reflectance via a predetermined number of reflectors becomes coincident with the center wavelength of extreme ultraviolet light to be reflected (S102).

REFERENCES:
patent: 6333961 (2001-12-01), Murakami
patent: 2003/0043866 (2003-03-01), Baillargeon et al.
patent: 2005/0079333 (2005-04-01), Wheatley et al.
patent: 2005/0201442 (2005-09-01), Luo et al.
patent: 2001-27699 (2001-01-01), None
patent: 2001-237174 (2001-08-01), None
International Search Report dated Jul. 29, 2003.
Communication from European Patent Office of Application No. 03 723 149.5-1234 dated Sep. 28, 2006.

Affiliated with

Also associated with

Rating

Reflection element of exposure light and production method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reflection element of exposure light and production method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reflection element of exposure light and production method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3779705