Reflection and refraction optical system and projection exposure

Details Reflection and refraction optical system and projection exposure Reflection and refraction optical system and projection exposure

1993-12-10

1996-12-10

Epps, Georgia Y.

Optical: systems and elements

Single channel simultaneously to or from plural channels

By partial reflection at beam splitting or combining surface

359727, 359729, G02B 2714, G02B 1700

Patent

active

055836968

ABSTRACT:
A reflection and refraction optical system includes a planner beam splitter, a concave mirror and a lens group, for imaging a fine pattern of a reticle upon a wafer, wherein a lens element of the lens group is disposed eccentrically with respect to an optical axis of the system by a predetermined amount or a parallel plate is disposed obliquely with respect to the optical axis, so as to produce a comma or distortion effective to cancel the comma or distortion produced by the beam splitter.

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patent: 5212593 (1993-05-01), Williamson
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patent: 5241423 (1993-08-01), Chiu
patent: 5251070 (1993-10-01), Hashimoto
patent: 5289312 (1994-02-01), Hashimoto

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