Reflectance enhancing thin film stack in which pairs of dielectr

Details Reflectance enhancing thin film stack in which pairs of dielectr Reflectance enhancing thin film stack in which pairs of dielectr

1997-06-09

2000-09-26

Malinowski, Walter

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

349137, 349138, G02F 11335, G02F 11333

Patent

active

061249122

ABSTRACT:
Applying layers of dielectric material to a reflective conductive surface of an integrated circuit, increases the reflectance of the surface. The layers of dielectric material alternate between high and low indices of refraction. To enable incident light waves to undergo a uniform phase change as the waves pass between the dielectric materials, the thickness of each of the layers of dielectric material is established such that each of the layers of dielectric material have a substantially equal optical thickness. As a result, when he dielectric layers reflect incident light waves, the reflected light waves constructively interfere to increase the reflectance of the surface of the integrated circuit.

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