Refining process of reactive gas for forming semiconductor layer

Details Refining process of reactive gas for forming semiconductor layer Refining process of reactive gas for forming semiconductor layer

1985-07-01

1986-11-18

Sever, Frank

Refrigeration

Processes

Circulating external gas

156DIG89, F25J 300

Patent

active

046233695

ABSTRACT:
A refined reactive gas is obtained by repeating more than once a step of liquefying a reactive gas and gasifying the liquefied gas in a liquefying and gasifying receptacle. Prior to the liquefaction-gasification step, cleaning treatment of the liquefying and gasifying receptacle thereinto hydrogen and then evacuating the receptacle.

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