Measuring and testing – Instrument proving or calibrating – Gas or liquid analyzer
Reexamination Certificate
2006-02-24
2010-10-19
Vu, David (Department: 2818)
Measuring and testing
Instrument proving or calibrating
Gas or liquid analyzer
C073S001010, C073S001060, C073S040700, C073S040000, C073S031060, C257S347000, C257S048000, C257S521000, C438S018000, C438S406000, C438S048000
Reexamination Certificate
active
07814773
ABSTRACT:
A reference leak (10) includes a first substrate (20), a second substrate (40) disposed and bonded on the first substrate, and predetermined numbers of leak channels (14) defined in at least one of the first and second substrates. Oblique walls of the leak channels are formed by crystal planes of the at least one of the first and second substrates, the oblique walls thereby being aligned according to such crystal planes. A method for making a reference leak is also provided.
REFERENCES:
patent: 4037306 (1977-07-01), Gutteridge et al.
patent: 4542650 (1985-09-01), Renken et al.
patent: 4851078 (1989-07-01), Short et al.
patent: 4874500 (1989-10-01), Madou et al.
patent: 4878957 (1989-11-01), Yamaguchi et al.
patent: 4975390 (1990-12-01), Fujii et al.
patent: 5388443 (1995-02-01), Manaka
patent: 5457333 (1995-10-01), Fukui
patent: 5632854 (1997-05-01), Mirza et al.
patent: 5846392 (1998-12-01), Knoll
patent: 5852308 (1998-12-01), Wood
patent: 6182502 (2001-02-01), Schwegler et al.
patent: 6265222 (2001-07-01), DiMeo et al.
patent: 6265750 (2001-07-01), Feng et al.
patent: 6812508 (2004-11-01), Fukumi
patent: 2003/0129809 (2003-07-01), Takyu et al.
patent: 2006/0272942 (2006-12-01), Sirringhaus
patent: WO 2004083843 (2004-09-01), None
Michael Quirk & Julian Serda “Semiconductor Manufacturing Technology” 2001 Prentice Hall p. 507.
Chen Pi-Jin
Du Bing-Chu
Fan Shou-Shan
Ge Shuai-Ping
Guo Cai-Lin
Fox Brandon
Hon Hai Precision Industry Co. Ltd.
Knapp Jeffrey T.
Tsinghua University
Vu David
LandOfFree
Reference leak does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Reference leak, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reference leak will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4205050