Reference leak

Measuring and testing – Instrument proving or calibrating – Gas or liquid analyzer

Reexamination Certificate

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Details

C073S001010, C073S001060, C073S040700, C073S040000, C073S031060, C257S347000, C257S048000, C257S521000, C438S018000, C438S406000, C438S048000

Reexamination Certificate

active

07814773

ABSTRACT:
A reference leak (10) includes a first substrate (20), a second substrate (40) disposed and bonded on the first substrate, and predetermined numbers of leak channels (14) defined in at least one of the first and second substrates. Oblique walls of the leak channels are formed by crystal planes of the at least one of the first and second substrates, the oblique walls thereby being aligned according to such crystal planes. A method for making a reference leak is also provided.

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patent: WO 2004083843 (2004-09-01), None
Michael Quirk & Julian Serda “Semiconductor Manufacturing Technology” 2001 Prentice Hall p. 507.

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