Reference electrode, ion sensor and method of manufacturing the

Details Reference electrode, ion sensor and method of manufacturing the Reference electrode, ion sensor and method of manufacturing the

1989-10-26

1991-11-19

Niebling, John F.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204416, 20419211, G01N 2726

Patent

active

050663836

ABSTRACT:
A reference electrode for generating a reference potential on an ion sensor is disclosed. The reference electrode has a lamination film covering a surface of an electrically conductive substrate and formed by alternately laminating silver halide thin films and hydrophobic resin thin films.

REFERENCES:
patent: 3856649 (1974-12-01), Genshaw et al.
patent: 3926764 (1975-12-01), Ruzicka et al.
patent: 3932233 (1976-01-01), Ruzicka et al.
patent: 3957612 (1976-05-01), Niedrach et al.
patent: 3957613 (1976-05-01), Macur
patent: 4053381 (1977-10-01), Hamblen et al.
patent: 4214968 (1980-07-01), Battaglia et al.
patent: 4280889 (1981-07-01), Szonntagh
patent: 4507194 (1985-03-01), Shimomura et al.
patent: 4753719 (1988-06-01), Yamaguchi et al.
patent: 4798664 (1989-01-01), Yamaguchi et al.
patent: 4816118 (1989-03-01), Oyama et al.
patent: 4839020 (1989-06-01), Yamaguchi et al.
patent: 4861454 (1989-08-01), Ushizawa et al.
patent: 4871442 (1989-10-01), Yamaguchi et al.
patent: 4927516 (1990-05-01), Yamaguchi et al.

Affiliated with

Also associated with

Rating

Reference electrode, ion sensor and method of manufacturing the does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reference electrode, ion sensor and method of manufacturing the , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reference electrode, ion sensor and method of manufacturing the will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1368096