Reduction projection system alignment method and apparatus

Details Reduction projection system alignment method and apparatus Reduction projection system alignment method and apparatus

1986-04-14

1988-10-25

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356400, G01B 1100

Patent

active

047799862

ABSTRACT:
A reduction projection system alignment method for detecting the positions of an alignment pattern on a reticle and an alignment pattern on a wafer projected onto a reticle by a reduction projection lens so as to relatively align the reticle and wafer. This method comprises providing spatial images emanating from patterns on the reticle and wafer surfaces as alginment patterns of at least one of the reticle and wafer, and detecting the alignment patterns of the reticle and wafer by the same detection optical system using lights which are different in the wavelength from that of an exposure light and different from each other between the reticle and wafer. An apparatus for performing this method is also disclosed.

REFERENCES:
patent: 4355892 (1982-10-01), Mayer et al.
patent: 4498762 (1985-02-01), Uehara et al.
patent: 4566795 (1986-01-01), Matsuura et al.
patent: 4592625 (1986-06-01), Uehara et al.
patent: 4616130 (1986-10-01), Omata

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