Reduction projection objective and projection exposure...

Details Reduction projection objective and projection exposure... Reduction projection objective and projection exposure...

2011-04-05

2011-04-05

Collins, Darryl J (Department: 2873)

Optical: systems and elements

Lens

With reflecting element

C359S364000

Reexamination Certificate

active

07920338

ABSTRACT:
A reduction projection objective for projection lithography has a plurality of optical elements arranged along an optical axis and designed for imaging an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio. The optical elements include at least one concave mirror. The optical elements are designed to provide an image-side numerical aperture NA>0.6 in a large effective image field having a maximum image field height Y′>25 mm. A compact, low mass projection objective enabling high throughput of exposed substrates is thereby obtained.

REFERENCES:
patent: 5515207 (1996-05-01), Foo
patent: 5636066 (1997-06-01), Takahashi
patent: 5652679 (1997-07-01), Freeman
patent: 6169627 (2001-01-01), Schuster
patent: 6426506 (2002-07-01), Hudyma
patent: 6590718 (2003-07-01), Furter et al.
patent: 6600608 (2003-07-01), Shafer et al.
patent: 7079314 (2006-07-01), Suenaga et al.
patent: 2002/0024741 (2002-02-01), Terasawa et al.
patent: 2003/0011755 (2003-01-01), Omura et al.
patent: 2003/0011894 (2003-01-01), Schuster
patent: 2003/0197922 (2003-10-01), Hudyma
patent: 2003/0197946 (2003-10-01), Omura
patent: 2003/0234912 (2003-12-01), Omura
patent: 2003/0234992 (2003-12-01), Shafer
patent: 2004/0012866 (2004-01-01), Mann et al.
patent: 2004/0130806 (2004-07-01), Takahashi
patent: 2004/0160677 (2004-08-01), Epple et al.
patent: 2005/0190435 (2005-09-01), Shafer et al.
patent: 2005/0248856 (2005-11-01), Omura et al.
patent: 10332112 (2005-01-01), None
patent: 1 069 448 (2001-01-01), None
patent: 1 098 215 (2001-05-01), None
patent: 1 318 425 (2003-06-01), None
patent: 1 336 887 (2003-08-01), None
patent: 2002208551 (2002-07-01), None
patent: 2002372668 (2002-12-01), None
patent: 2003114387 (2003-04-01), None
patent: 2004-317534 (2004-11-01), None
patent: 2005003982 (2005-01-01), None
patent: WO 92/05462 (1992-04-01), None
patent: WO 94/06047 (1994-03-01), None
patent: WO 01/04682 (2001-01-01), None
patent: WO 01/51979 (2001-07-01), None
patent: WO 01/55767 (2001-08-01), None
patent: WO 01/59502 (2001-08-01), None
patent: WO 03/036361 (2003-05-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/107011 (2004-12-01), None
patent: WO 2005/040890 (2005-05-01), None
patent: WO 2005/059654 (2005-06-01), None
patent: WO 2005/111689 (2005-11-01), None
Willi Ulrich et al, “Trends in Optical Design of Projection Lenses for UV-and EUV-Lithography”, Proc. of SPIE vol. 4146 (2000).
E. Glatzel, “New Lenses for Microlithography”, SPIE vol. 237 (1980), pp. 310-320.
Tomoyuki Matsuyama, et al, “High NA and Low Residual Aberration Projection Lens for Duv Scanner”, SPIE, vol. 4691, (2002) pp. 687-695.
Tomoyuki Matsuyama, et al. “Microlithographic Lens for DUV Scanner”, SPIE vol. 4832 Dec. 2002, Conference Jun. 3-7, 2003 pp. 170-174.
J.H. Bruning, “Optical Lithography—Thirty Years and Three Orders of Magnitude”, SPIE vol. 3049, pp. 14-27.
Tomoyuki Matsuyama, et al “Nikon Projection Lens Update”, in Optical Microlithography XVII, Proc. of SPIE , vol. 5377.65 (2004).
M.H. Freeman, “Innovative Wide-Field Binocular Design”, OSA Proceedings of the International Optical Design Conference (OSA) 1994, vol. 22, pp. 389-393.
Donald Dejager, “Camera Viewfinder Using Tilted Concave Mirror Erecting Elements”, SPIE vol. 237, 1980 International Lens Design Conference (OSA) pp. 292-298.

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