Reduction projection lens system including refractive and diffra

Optical: systems and elements – Having significant infrared or ultraviolet property – Lens – lens system or component

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Details

359565, 359651, G02B 308, G02B 302, G02B 518, G02B 1318

Patent

active

055554792

ABSTRACT:
The invention relates to a reduction projection lens system of high resolution which enables chromatic aberration to be corrected, and can be improved in terms of transmittance by making the total thickness of the vitreous material forming said lens system. This reduction projection lens system includes refractive and diffractive optical elements and uses as the light source a spectral light source having a center wavelength of up to 300 nm and a wavelength spectral bandwidth of .+-.0.5 pm to .+-.200 pm such as an ArF or KrF excimer laser. The refractive optical element includes at least one aspheric surface, and the refractive and diffractive optical elements are made of the same vitreous material, e.g., SiO.sub.2. conditions, 0.02<.vertline.d/D.vertline.<0.17 and 0.01<.vertline.h/H.vertline.<0.25 are satisfied, wherein d is the distance from the pupil of the lens system to the diffractive optical element, D is the conjugate distance, h is the height of the off-axis principal ray farthest off the axis in the diffractive optical element, and H is the effective radius of the diffractive optical element.

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