Reduction of residual chloride in iron oxides

Details Reduction of residual chloride in iron oxides Reduction of residual chloride in iron oxides

1994-03-15

1995-03-28

Bos, Steven

Chemistry of inorganic compounds

Oxygen or compound thereof

Metal containing

423DIG1, 423633, 423634, 4231501, C01G 4902

Patent

active

054014859

ABSTRACT:
A process for reducing the residual chloride present in iron oxides, particularly in regenerated iron oxides produced from hydrochloric acid waste liquid generated from steel pickling, by post-synthesis treatment of the iron oxides with sulfuric acid optionally followed by drying and calcining. The purified regenerated iron oxides are particular suitable for making iron oxide based catalysts such as ethylbenzene dehydrogenation catalysts and high-grade ferrites.

REFERENCES:
patent: 495197 (1893-04-01), Fronheiser
patent: 887042 (1908-05-01), Heckman
patent: 1837709 (1931-12-01), Heckman
patent: 2105670 (1938-01-01), Perkins
patent: 3635664 (1972-01-01), Morimoto
patent: 4092401 (1978-05-01), Dreulle
patent: 4219354 (1980-08-01), Rastas et al.
patent: 4289746 (1981-09-01), Hayakawa et al.
patent: 4355005 (1982-10-01), Rastas et al.
patent: 4452762 (1984-06-01), Fugleberg et al.
patent: 4565675 (1986-01-01), Uchino et al.
patent: 4701221 (1987-10-01), Brunn et al.
patent: 4935219 (1990-06-01), Escolar et al.
patent: 5190906 (1993-03-01), Murakami et al.
Removal of Chloride Ions from Hematite Powders for Ferrite Production, K. Suganuma, T. Obi, and G. Furusho, 4th International Conference in Ferrites, Part I. Advanced in Ceramics, vol. 15 pp. 81-85, no date.

Affiliated with

Also associated with

Rating

Reduction of residual chloride in iron oxides does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reduction of residual chloride in iron oxides, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reduction of residual chloride in iron oxides will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2248704