Reduction exposure apparatus with correction for alignment light

Details Reduction exposure apparatus with correction for alignment light Reduction exposure apparatus with correction for alignment light

1991-08-19

1993-05-25

Turner, Samuel A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, G01B 1126

Patent

active

052144933

ABSTRACT:
A diffraction grating shaped reference pattern having the same grating pitch as diffraction grating shaped alignment pattern formed on a wafer is irradiated by alignment light, and the diffracted light signal obtained from the reference pattern is stored in a memory. The diffraction grating shaped alignment pattern formed on the wafer is irradiated by the alignment light, and the diffracted light signal from the alignment pattern is corrected based on the diffracted light signal stored in the memory.

REFERENCES:
patent: 4943733 (1990-07-01), Mori et al.

Affiliated with

Also associated with

Rating

Reduction exposure apparatus with correction for alignment light does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reduction exposure apparatus with correction for alignment light, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reduction exposure apparatus with correction for alignment light will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-901377