Metal treatment – Compositions – Heat treating
Patent
1980-06-27
1982-01-19
Roy, Upendra
Metal treatment
Compositions
Heat treating
148187, 357 39, 357 91, 427 431, H01L 21263, H01L 29167, H01L 754
Patent
active
043115349
ABSTRACT:
A method of reducing the reverse recovery charge of thyristors without substantially increasing forward voltage drop by first determining the depth of the anode PN junction from a major surface adjoining a cathode emitter region. The depth of maximum defect generation in thyristor on irradiation through the major surface with a given radiation source radiating particles with molecular weight greater than one, preferably proton or alpha particles, and adjusting the energy level at the major surface of the thyristor from the radiation source to provide the depth of maximum defect generation adjacent the anode PN junction and preferably in the anode base region within 20 micrometers of the anode PN junction or in the anode emitter region within 15 micrometers of the anode PN junction. Thereafter the thyristor is irradiated through said major surface with the adjusted energy level from the radiation source to a given dosage to reduce the reverse recovery stored charge of the thyristor without substantially increasing the forward voltage drop.
REFERENCES:
patent: 4056408 (1977-11-01), Bartko et al.
patent: 4075037 (1978-02-01), Tarneja et al.
patent: 4134778 (1979-01-01), Sheng et al.
patent: 4137099 (1980-01-01), Sun
patent: 4224083 (1980-09-01), Cressnell
patent: 4240844 (1980-12-01), Felice et al.
patent: 4259683 (1981-03-01), Adler et al.
Bartko John
Chu Chang K.
Schlegel Earl S.
Tarneja Krishan S.
Menzemer C. L.
Roy Upendra
Westinghouse Electric Corp.
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