Reducing aberration in optical systems comprising cubic...

Optical: systems and elements – Polarization without modulation – Depolarization

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C359S490020, C359S490020, C359S352000, C359S355000, C250S330000

Reexamination Certificate

active

06844972

ABSTRACT:
An optical system includes multiple cubic crystalline optical elements and one or more polarization rotators in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements. In one embodiment, all cubic crystalline optical elements are oriented with identical three dimensional cubic crystalline lattice directions, a 90° polarization rotator divides the system into front and rear groups such that the net retardance of the front group is balanced by the net retardance of the rear group. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.

REFERENCES:
patent: 3758201 (1973-09-01), MacNellie
patent: 4239329 (1980-12-01), Matsumoto
patent: 4534649 (1985-08-01), Downs
patent: 4576479 (1986-03-01), Downs
patent: 5033830 (1991-07-01), Jameson
patent: 5537260 (1996-07-01), Williamson
patent: 6081382 (2000-06-01), Omura
patent: 6084708 (2000-07-01), Schuster
patent: 6137626 (2000-10-01), Takaoka
patent: 6172380 (2001-01-01), Noguchi et al.
patent: 6195213 (2001-02-01), Omura et al.
patent: 6201634 (2001-03-01), Sakuma et al.
patent: 6252712 (2001-06-01), Furter et al.
patent: 6259508 (2001-07-01), Shigematsu
patent: 6324003 (2001-11-01), Martin
patent: 6455862 (2002-09-01), van der Veen et al.
patent: 6683710 (2004-01-01), Hoffman et al.
patent: 20010026006 (2001-10-01), Noble et al.
patent: 20030011893 (2003-01-01), Shiraishi et al.
patent: 20030021026 (2003-01-01), Allan et al.
patent: 20030025894 (2003-02-01), Owa et al.
patent: 20030053036 (2003-03-01), Fujishima et al.
patent: 20030058421 (2003-03-01), Omura et al.
patent: 20030067679 (2003-04-01), Allan et al.
patent: 20030086071 (2003-05-01), McGuire, Jr.
patent: 20030086156 (2003-05-01), McGuire, Jr.
patent: 20030086171 (2003-05-01), McGuire
patent: 20030099047 (2003-05-01), Hoffman et al.
patent: 20030168597 (2003-09-01), Webb et al.
patent: 20030234981 (2003-12-01), Hoffman et al.
patent: 20040001244 (2004-01-01), Hoffman et al.
patent: 0 828 172 (1998-03-01), None
patent: 1 063 684 (2000-12-01), None
patent: 1063684 (2000-12-01), None
patent: 1115019 (2001-07-01), None
patent: 1139138 (2001-10-01), None
patent: 2000331927 (2000-11-01), None
patent: WO 02093209 (2002-11-01), None
patent: WO 02097508 (2002-12-01), None
patent: WO 02099500 (2002-12-01), None
patent: WO 03001271 (2003-01-01), None
patent: WO 03009021 (2003-01-01), None
patent: WO 03009050 (2003-01-01), None
patent: WO 03009062 (2003-01-01), None
Burnett et al., “Intrinsic Birefringence in 157 nm Materials,” Proc. 2nd, Intl. Symp on 157 nm Lithography, 2001, pp. 1-13, International SEMATECH, Austin, Texas.
D. Krähmer, “Intrinsic Birefringence in CaF2,” at CaF2Birefringence Workshop, Intl SEMATECH, Jul. 18, 2001, pp. 1-9.
Morton et al., “Testing Optical Damage for 157 nm Lithography,” Semiconductor International, http://www.e-insite.net/semiconductor/index.asp?layout=article&stt (Feb. 2002).
A Hand, “157 nm Optics Demand a Bag of Tricks,” Semiconductor International, http://www.e-insite.net/semiconductor/index.asp?layout=article&stt (Feb. 2001).
Shiraishi et al., “Current Status of Nikon's Investigation on CaF2Intrinsic Birefringence,”International-SEMATECH Calcium Fluoride Birefringence Workshop, Jul. 18, 2001, pp. 1-15.
Burnett et al., “Intrinsic birefringence in calcium fluoride and barium fluoride,” Physical Review B, vol. 64, pp. 241102-1—241102-4.
Burnett, et al., “Minimizing spatial-dispersion-induced birefringence in crystals for precision optics by using mixed crystals of materials with t opposite sign of the birefringence,” National Institute of Standards and Technology, Gaithersburg, Maryland 20899, http://physics.nist.gov/Divisions/Div842/Gp3/DUVMatChar/birefring.ht (Jul. 12, 2001), pp. 1-3.
Burnett et al., “Alternative Materials Development (LITJ216) Final Report—Stress Birefringence, Intrinsic Birefringence, and Index Properties of 157 nm Refractive Materials,” International SEMATECH, Feb. 28, 2002, 33 pages.
J. Dyson, “Unit magnification optical system without Seidel aberrations,”J. Opt. Soc. Am.,vol. 49, 1959, p. 713 as described by R. Kingslake, “Lens Design Fundamentals,” Institute of Optics, University of Rochester, Academic Press, Inc., 1978, pp. 320-321.
U.S. application No. 10/071,375, filed feb. 7, 2002. Applicants: Jeffrey M. Hoffman and James P. McGuire.
U.S. application No. 10/178,601, filed Jun. 20, 2002. Applicant: James P. McGuire (OPTRES.002A).
U.S. application No. 10/178,937, filed Jun. 20, 2002. Applicant: James P. McGuire. (OPTRES.003A).
U.S. Application No. 10/178,935, filed Jun. 20, 2002. Applicant: James P. McGuire (OPTRES.008A).
U.S. application No. 10/331,159, filed Dec. 26, 2002, titled Structures and Methods for Reducing Polarization Aberration in Optical Systems.
U.S. application No. 10/331,101, filed Dec. 26, 2002, titled Methods for Reducing Polarization Aberration in Optical Systems.
U.S. application No. 10/331,103, filed Dec. 26, 2002, titled Structures and Methods for Reducing Polarization Aberration in Integrated Circuit Fabrication Systems.
Burnett, J.H. et al., “Intrinsic Birefringence in 157 nm Materials,” Proceedings of the International Symposium on 157NM Lithography, Dane Point, CA, May 15, 2001, XP002218849, pp. 1-13.
Burnett, J.H. et al., “Intrinsic Birefringence in calcium fluoride,” preprinted handed out at 2ndInternational Symposium on 157NM Lithography, Dana Point, CA, May 15, 2001, XP002232195, pp. 1-17.
Yeh, P. et al., “Optics of Liquid Crystal Displays,” John Wiley & Sons, Inc., New York, 1999, pp. 380-385.
Burnett, et al., “Intrinsic Birefringence in Calcium Fluoride,” National Institute of Standards and Technology, Gaithersburg, Maryland 20899, Submitted for Publication to Physical Review Letters (May 11, 2001), pp. 1-12.
Rudolf Kingslake,Lens Design Fundamentals,1978, pp. 320-321, Academic Press, Inc. San Diego, California.
U.S. Provisional patent application 60/306,206, filed Jul. 18, 2001 which is priority document for WO 03/009050.
U.S. Provisional patent application 60/308,844, filed Aug. 1, 2001, (Japanese language).
English translation of Provisional patent application 60/308,844 filed Aug. 1, 2001 (filed in USPTO on Oct. 23, 2002).
U.S. patent application 10/371,266, filed Feb. 20, 2003 (OPTRES.026C1).
U.S. patent application 10/371,269, filed Feb. 20, 2003 (OPTRES.026DV1).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reducing aberration in optical systems comprising cubic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reducing aberration in optical systems comprising cubic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reducing aberration in optical systems comprising cubic... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3385632

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.