Reduced scratch sensitization in nucleated photographic film

Details Reduced scratch sensitization in nucleated photographic film Reduced scratch sensitization in nucleated photographic film

1996-08-30

1997-12-30

Huff, Mark F.

Radiation imagery chemistry: process, composition, or product th

Silver halide colloid tanning process, composition, or product

430523, 430961, G03C 176, G03C 104

Patent

active

057028648

ABSTRACT:
A hybrid lith photographic film substantially resistant to the formation of scratch-related defects that occur during the manufacturing and handling process having an anti-abrasion coating on the silver halide emulsion layer containing a polyalkylene oxide surfactant.

REFERENCES:
patent: 3730727 (1973-05-01), Olivares et al.
patent: 4224401 (1980-09-01), Takada et al.
patent: 4269929 (1981-05-01), Nothnagle
patent: 4686167 (1987-08-01), Resnick et al.
patent: 4777113 (1988-10-01), Inoue et al.
patent: 4798780 (1989-01-01), Hall et al.
patent: 4882261 (1989-11-01), Kojima et al.
patent: 4937160 (1990-06-01), Ruger
patent: 5224772 (1993-07-01), Piechowski et al.
patent: 5451486 (1995-09-01), Pilot et al.
patent: 5541049 (1996-07-01), Ballerini et al.
patent: 5571665 (1996-11-01), Ballerini et al.

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