Reduced pitch multiple exposure process

Details Reduced pitch multiple exposure process Reduced pitch multiple exposure process

2011-07-19

2011-07-19

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

C430S311000

Reexamination Certificate

active

07981595

ABSTRACT:
A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.

REFERENCES:
patent: 5902716 (1999-05-01), Owa et al.
patent: 2002/0195419 (2002-12-01), Pavelchek
patent: 2003/0008245 (2003-01-01), Iwasaki et al.
patent: 2003/0091940 (2003-05-01), Nakao
patent: 2003/0129531 (2003-07-01), Oberlander et al.
patent: 2004/0005507 (2004-01-01), Lakkapragada et al.
patent: 2004/0101790 (2004-05-01), Cauchi et al.
patent: 2005/0175937 (2005-08-01), Bae
patent: 61-174718 (1986-08-01), None
patent: 02-262319 (1990-10-01), None
patent: 04-071222 (1992-03-01), None
patent: 08-250395 (1996-09-01), None
patent: 11-072925 (1999-03-01), None
patent: 2002-367877 (2002-12-01), None
Notice of Reasons for Rejection for Japanese Patent Application No. 2006-114997 dated Jun. 1, 2009.

Affiliated with

Also associated with

Rating

Reduced pitch multiple exposure process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reduced pitch multiple exposure process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reduced pitch multiple exposure process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2684114