Reduced lens heating methods, apparatus, and systems

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

07947412

ABSTRACT:
In one embodiment, a system is disclosed that includes an illuminator having a source that produces light waves having a first wavelength, and a mask. The mask includes at least one partly opaque area and at least one opening within the opaque area includes a slanted, sub-resolution feature that redistributes a portion of the light passing through the open area to an off-axis location. A method of forming a device by way of photolithography might include forming unresolvable features on a mask and projecting light through the mask. Other systems, methods, and apparatus are disclosed.

REFERENCES:
patent: 2002/0006734 (2002-01-01), Imai et al.
patent: 2005/0014078 (2005-01-01), Baggenstoss et al.
patent: 2006/0132748 (2006-06-01), Fukuhara
patent: 2006/0183028 (2006-08-01), Meyne et al.
patent: 2007/0224519 (2007-09-01), Sivakumar et al.
patent: 2008/0160422 (2008-07-01), Chen et al.
patent: 2008/0226992 (2008-09-01), Landis et al.

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